MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202647089669 A) filed by Asml Netherlands B. V. on July 23, 2026, for Extreme Ultraviolet Light Generation Sequence For An Extreme Ultraviolet Light Source.
Inventors include Piovan, Giulia; Chang, Steven; Rafac, Robert, Jay; Hall, Daniel, Leslie; Wang, Haining; Ghetmiri, Damon, Erfan; Hahn, Eric, Nicholas; Purvis, Michael, Anthony; and Brown, Daniel, John, William.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: A method for selecting operating parameters of an EUV light source includes selecting a temporal or spatial relationship between a plurality of illuminations of a target by first, second, and third laser beams. The method further includes setting an initial value of a temporal delay between the second laser beam and the third laser beam. The method further includes setting an initial value of an energy of the second laser beam. The method further includes measuring an EUV energy generated by the illuminations of the target based on the initial value of the temporal delay between the second laser beam and the third laser beam and the initial value of the energy of the second laser beam. The method further includes adjusting the temporal delay between the second laser beam and the third laser beam and the energy of the second laser beam in response to the measuring.
Disclaimer: Curated by HT Syndication.
