MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202517121956 A) filed by Caihong Display Devices Co. , Ltd. on December 04, 2025, for Filling Structure And Method For Reducing Acicular Defects In Substrate Glass.
Inventors include Wang, Menglong; Hou, Hongrong; Yang, Wei; and Zhang, Tao.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: The present invention belongs to the technical field of the prevention and control of defects in substrate glass, and discloses a filling structure and method for reducing acicular defects in substrate glass. For the filling structure provided by the present invention, the thermal insulation and heating characteristics of a filling material are comprehensively considered, and therefore environmental conditions for a crystallization reaction are fundamentally optimized. By constructing a multi-layer thermal-insulation filling structure, the phenomenon of crystallization is effectively suppressed, thereby greatly reducing the generation of acicular defects. By means of the scientific and rational distribution of a filling material layer, a thermal expansion difference between a platinum body and a surrounding refractory material is balanced, the risk of structural damage caused by excessive thermal stress is reduced, and the stability and safety of the production process are further ensured. Moreover, by means of the introduction of a heating element, fine control over the temperature in a platinum tube region is achieved; therefore, a local temperature difference can be effectively reduced, and the phenomenon of crystallization can be further suppressed.
Disclaimer: Curated by HT Syndication.
