MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202647106821 A) filed by Yanyang New Energy Suzhou Co. , Ltd. on September 04, 2026, for Full-Aperture Stencil And Printing Device.
Inventors include Hu, Bingfeng; and Zhang, Qiong.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: A full-aperture stencil and a printing device. The full-aperture stencil comprises a stencil main body (110), the stencil main body (110) is formed with a full-aperture pattern for single-pass printing of fine-fingers and busbars or connecting lines connected to the fine fingers, wherein the full-aperture pattern comprises a plurality of main lines (1) extending in a first direction and a plurality of connecting portions disposed on the main lines (1) in a second direction, and the main lines (1) are provided as continuous openings configured for printing and forming the fine fingers. The connecting portions are configured for simultaneously printing and forming the connecting lines during printing, so as to bridge the fine fingers adjacent in the second direction. The stencil main body (110) comprises a first metal layer (111) and a second metal layer (112). The first metal layer (111) forms a contour of the full-aperture pattern. The second metal layer (112) is stacked on the first metal layer (111) and is provided with a paste-permeable pattern (3) corresponding to the full-aperture pattern, and the paste-permeable pattern (3) is provided with discontinuous openings at least in an area corresponding to the connecting portions.
Disclaimer: Curated by HT Syndication.
