MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202617060321 A) filed by Atg Ceylon Pvt Limited on May 12, 2026, for Garment Material.
Inventors include Taylor, John; Abdeen, Mohamed Fazal; Mendis, Sunil; and Goth, Andrew.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: A garment material 40 comprising: a first layer, wherein the first layer is a shaped polymer; a second layer, wherein the second layer is a shaped polymer 46 that is provided at one or more locations on the first layer, the second layer taking the shape of the first layer at said one or more locations; and a textile layer; wherein the second layer is located between the first layer and the textile layer; wherein the second layer comprises a liner 48 embedded in the shaped polymer of the second layer, the liner being formed of yarn and there are interstices through the liner, and wherein: the yarn of the liner has a weight per length of 10 to 60 Dernier; and the liner has a weight per area in the garment material or in a region of the garment material that is from 5 to 35 g/m2.
Disclaimer: Curated by HT Syndication.
