MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202617070031 A) filed by Dai Nippon Printing Co. , Ltd. on June 04, 2026, for Hydrogen Sensor And Hydrogen Detection System.
Inventors include Itoh, Nobuyuki; and Mishima, Satoru.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: The present disclosure provides a hydrogen sensor comprising: a substrate; a sensitive film disposed on a first surface of the substrate and including tungsten oxide and a catalyst for dissociating hydrogen molecules; a pair of electrodes disposed on the first surface of the substrate and in contact with the sensitive film; and an IC tag connected to the pair of electrodes. The IC tag: includes an IC chip, an antenna connected to the IC chip, and a pair of sensor terminals connected to the IC chip and connected respectively to the pair of electrodes; and is of an open/short type in which the IC chip is determined as being in a high resistance state when the resistance value between the sensor terminals is less than or equal to a first threshold resistance value and in a low resistance state when the resistance value between the sensor terminals is equal to or smaller than a second threshold resistance value that is smaller than the first threshold resistance value. The resistance value between the sensor terminals becomes equal to or greater than the first threshold resistance value when the hydrogen concentration is zero, and becomes equal to or smaller than the second threshold resistance value when the hydrogen concentration is a set value.
Disclaimer: Curated by HT Syndication.
