MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202621071505 A) filed by Indian Institute Of Science Education And Research Bhopal on June 09, 2026, for Instantaneous And Differential Current-Controlled Precision Manufacturing System For Micro And Nano-Scale Metal Probes.
Inventors include Dr Santanu Talukder; Abhishek Kumar; Debjit De Sarkar; and Anshuman Panda.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: The present invention relates to an automated differential current-controlled electrochemical etching system 100 for batch fabrication of ultra-sharp metal nanoprobes. The system 100 comprises a DC power supply branched into multiple independent channels, each connected to an electrochemical cell 104 including a metal probe and counter electrode immersed in an electrolyte. Each channel integrates a current sensor 103 configured to continuously measure instantaneous etching current, wherein a microprocessor-based controller 105 computes differential resistance and rate-of-change parameters in real time. Upon detection of a predefined necking condition based on combined current and differential resistance thresholds, a relay 102 automatically disconnects the corresponding channel to terminate etching. The system 100 further includes a micrometer-based mechanical unit 106 for precise immersion control. The architecture enables simultaneous, independent, and reproducible fabrication of multiple nanoprobes with controlled apex geometry, reduced operator dependency, and improved throughput suitable for scanning probe and nano- characterization applications.
Disclaimer: Curated by HT Syndication.
