MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202647086516 A) filed by Koken Ltd. on July 15, 2026, for Mask.
Inventors include Sato Akihiro; and Sugita Haruka.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: [Problem] To provide a mask capable of maintaining a comfortable fit as much as possible. [Solution] A mask 1 comprises a mask body part 2 and a face-contact body 3. The mask body part 2 is provided with a shape retainer 6 for retaining a three-dimensional structure during wear, the shape retainer 6 comprising: a shape-retainer-side central portion 60a that covers the central part in the left- right direction of the face of a wearer 100 along the vertical direction; shape-retainer-side folded portions 60b, 60b that are connected to the lateral sides of the shape-retainer-side central portion 60a and folded along the vertical direction of the mask body part 2; and shape-retainer-side lateral portions 60c, 60c provided by being connected to the lateral sides of the shape-retainer-side folded portions 60b, 60b and covering the lateral sides of the face of the wearer 100. The shape-retainer-side central portion 60a includes an upper reduced-width portion 610 and a lower reduced-width portion 620 in which the width in the left-right direction decreases from the central part in the top-bottom direction toward the top and/or the bottom. Slits 71-77 for further retaining the three-dimensional structure during wear are provided in the shape retainer 6.
Disclaimer: Curated by HT Syndication.
