MUMBAI, India, July 31 -- Intellectual Property India has published a patent application (202644005835 A) filed by Nokia Technologies Oy on January 20, 2026, for Measurement Alignment For Aiml Positioning.
Inventors include Hyun-Su Cha; and Gilsoo Lee.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: ABSTRACT MEASUREMENT ALIGNMENT FOR AIML POSITIONING Example embodiments of the present disclosure are directed to measurement alignment for artificial intelligence / machine learning positioning. In a method, a first apparatus receives, from a second apparatus, first information associated with measurement reporting for positioning. The first apparatus transmits, to a third apparatus, second information comprising a reporting resolution of a positioning measurement or a reference signal related to a transmission reception point. In this case, at least one of the positioning measurement or the reference signal is determined using a model for positioning at the first apparatus. (FIG. 6)
Disclaimer: Curated by HT Syndication.
