MUMBAI, India, July 31 -- Intellectual Property India has published a patent application (202647086900 A) filed by Asml Netherlands B. V. on July 16, 2026, for Method And Apparatus For Assessing A Sample Surface, Method Of Scanning A Sample Surface, And Charged Particle Assessment Apparatus.
Inventor includes Maassen, Martinus, Gerardus, Johannes, Maria.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: The present disclosure provides methods and apparatus relating to assessing a sample surface using charged particles. In one arrangement, a method comprises, at a first region of a sample surface on which is an intended pattern, relative scanning a beam over an elongate row portion of the intended pattern along a first direction to generate a row data set. At a second region of the sample surface on which is a repeat of the intended pattern, the beam is relative scanned over an elongate column portion of the intended pattern along a second direction to generate a column data set. The row data set and the column data set are processed to compare between the row data set and the column data set a common portion of the intended pattern to assess the common portion.
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