MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202648060323 A) filed by Daikin Industries, Ltd. on May 12, 2026, for Method For Coexisting 1,2-Difluoroethylene (hfo-1132) And Oxygen In Gas Phase, And Storage Container And Refrigerator Containing Hfo-1132 And Oxygen.
Inventors include Gotou, Tomoyuki; and Yoshimura, Takashi.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: An object is to suppress the polymerization reaction or self-decomposition reaction of 1,2-difluoroethylene. Provided as a means for achieving the object is a method for allowing 1,2- 5 difluoroethylene (HFO-1132) and oxygen to coexist in a gas phase, the concentration of oxygen in the gas phase at a temperature of 25°C being 1000 volume ppm or less
Disclaimer: Curated by HT Syndication.
