MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617091746 A) filed by Agc Inc. on July 29, 2026, for Method For Producing Fluoropolymer.
Inventors include Taguchi Daisuke; Toyoda Mizuna; and Yanagawa Haruki.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The problem addressed by the present invention is to provide a method for producing a fluoropolymer by which a fluoropolymer having a small MFR can be obtained. Provided is a method for producing a fluoropolymer that produces a fluoropolymer by polymerizing monomers including a fluoromonomer in a solvent, the production method being characterized in that the solvent includes a compound A represented by formula (A) Ra1-O-Ra2 and the total content of compound B represented by formula (B) Rb1-CF=CF-O-Rb2 and compound C represented by formula (C) Rc1-OH is 1.00 mass% or less relative to the content of compound A.
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