MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202647084727 A) filed by Sumitomo Seika Chemicals Co. , Ltd. on July 10, 2026, for Method For Producing Water Absorbent Resin And Method For Producing Water Absorbent Resin Particles.
Inventor includes Maeda Hiroki.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: Disclosed is a method for producing a water absorbent resin, the method including a dehydration step for dehydrating a water absorbent resin for recycling, which includes water and a water absorbent resin. The dehydration step is performed so that the weight- average molecular weight of the water absorbent resin for recycling after dehydration is 1,000,000 or more. After the dehydration step, the water absorbent resin for recycling after dehydration is placed in an environment in which the weight-average molecular weight thereof is 300,000 or more after 7 days have elapsed.
Disclaimer: Curated by HT Syndication.
