MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202617060261 A) filed by Nihon Parkerizing Co. , Ltd. on May 12, 2026, for Method For Suppressing Surfactant Decomposition And Method For Cleaning Aluminum Or Aluminum Alloy.
Inventors include Shimizu, Akio; Kikuchi, Ryuga; Tokue, Masaru; and Tsuneishi, Akinobu.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: The purpose of the present invention is to provide technology that makes it possible to greatly suppress decomposition of a surfactant without adding a stabilizer. The problem is solved by a method for suppressing surfactant decomposition in a cleaning solution that is for aluminum or an aluminum alloy and that contains an inorganic acid, iron ions, and 0.1-10 g/L of a surfactant, wherein the cleaning solution has a pH of not more than 2. Said method comprises a step for adding into the cleaning solution one or more oxo acid salts selected from the group consisting of mono-oxo acid salts and dioxo acid salts.
Disclaimer: Curated by HT Syndication.
