MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202647075571 A) filed by Asml Netherlands B. V. on June 18, 2026, for Method Of Determining A Correction For An Exposure Process, Lithography Apparatus And Computer Program.
Inventors include Schoonewelle, Hielke; Yang, Yuanqing; Brinkhof, Ralph; Domen, Kenian, Franciscus, Elisabeth, Maria; Shah, Anuj, Mayur; Pramodh, Arjun; Shrestha, Pratik; Yanson, Oleksiy, Igorevich; and Aveklouris, Angelos.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: Disclosed is a method of determining a correction for an exposure process for exposing structures on a substrate. The method comprises obtaining metrology data relating to at least a first layer on the substrate; modeling the metrology data in accordance with a first field layout of said first layer to obtain at least one first model, the first field layout comprising one or more fields having a first field size; and determining said correction by evaluating said at least one first model in accordance with a second field layout of a second layer on the substrate, said second field layout comprising one or more fields having a second field size different from said first field size.
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