MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202521010850 A) filed by Epsilon Advanced Materials Pvt. Ltd. on February 07, 2025, for Method Of Making An Electrode Material.
Inventors include Chinnasamy Natarajan; and Rongali Hareesh.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: A method of making an electrode material is described. The method includes the steps of mixing carbonaceous material with a carbon precursor to obtain a precursor mixture, heating the precursor mixture at a temperature in a range from about 400 degrees Celsius to about 900 degrees Celsius for a time in a range from about 3 hours to about 5 hours to obtain a treated mixture. The method further includes the step of heating the treated mixture mix at a temperature in a range from about 2400 degrees Celsius to about 3000 degrees Celsius for a time in a range from about 3 hours to about 5 hours to obtain the electrode material. The electrode material has a degree of anisotropy of crystal grain alignment less than about 3.5, and has an average particle size in a range from about 10 microns to about 20 microns, a degree of granulation above 75%, a orientation index less than 2.7, and a degree of disorder (ID/IG) less than 0.1. Figure 1 may be used for the abstract
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