MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202611058513 A) filed by Indian Institute Of Technology, Mandi on May 08, 2026, for Mof/Polymer Printable Ink For The Fabrication Of 3d Printed Structures.
Inventors include Ipsita Pattanayak; Rik Rani Koner; Dr. Satvasheel Powar; and Praveen Kumar.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: The present invention relates to a printable ink composition and process for preparing the same. More particularly, the present invention relates to zinc based metal organic framework (Zn-MOF)/ polymer printable ink composition exhibiting controlled rheological properties for the fabrication of 3D printed structures by direct ink writing (DIW), a process for preparing said Zn-MOF/ polymer printable ink, and uses thereof. Fig. 1
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