MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202617079174 A) filed by Kolon Industries, Inc. on June 26, 2026, for Nanomembrane, Waterproof Ventilation Sheet Comprising Same, And Method For Manufacturing Nanomembrane.
Inventors include Choi, Samuel; Kim, Sung Jin; Oh, Heung Ryul; and Lee, Min Ho.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: The present invention relates to a waterproof sheet having improved waterproofness and air permeability by adjusting the electrical conductivity of an electrospinning solution to adjust the size of micropores of a nanomembrane. The present invention relates to a nanomembrane formed of synthetic fibers including polyvinylidene fluoride and a metal complex dye, and having a water pressure resistance of 5,000-15,000 mmH2O.
Disclaimer: Curated by HT Syndication.
