MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202647070892 A) filed by Toray Industries, Inc. on June 08, 2026, for Nonwoven Fabric And Method For Producing Same, And Laminated Nonwoven Fabric.
Inventors include Katsuta Hiroo; Hara Shohei; Maekawa Shigetoshi; and Kajiwara Kentaro.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: The present invention addresses the problem of providing nonwoven fabric that has both excellent strength and rigidity. This nonwoven fabric is composed of hollow fibers containing a propylene-based resin as a main component, wherein: the ratio (Mz/Mw) between the Z average molecular weight Mz and the weight average molecular weight Mw of the propylene-based resin is 2.0-6.0; the hollow fibers have an average single fiber diameter of 5.0-50.0 µm and an average hollow ratio of 31.0%-60.0%; and the nonwoven fabric has a melt mass flow rate of 16-55 g per 10 minutes.
Disclaimer: Curated by HT Syndication.
