MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202517128325 A) filed by Caihong Display Devices Co. , Ltd. on December 17, 2025, for Overflow Brick, Device And Method For Stably Producing Substrate Glass.
Inventors include Hu, Weidong; Zhang, Zhijun; Xu, Jian; Zhao, Longjiang; Ren, Yongjing; and Luo, Ting.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: The present application belongs to the technical field of the manufacturing of liquid crystal substrate glass. Disclosed are an overflow brick, device and method for stably producing substrate glass. The overflow brick provided in the present application uses a separable arch-shaped overflow brick structure, thus reducing the impact of the gravity of the overflow brick itself on the production stability; besides this, L-shaped support and clamping devices are introduced, such that the negative impact caused by creep is counteracted by means of applying a horizontal clamping force. By means of designing a fixed connection surface between a first brick body and a second brick body as an arch-shaped curved surface, and combining same with the clamping force provided by the support and clamping devices, the overall structural stability of the overflow brick is enhanced, and under high-temperature and long-term service conditions, the overflow brick can also suppress the creep phenomenon that may occur during the production of high-generation substrate glass, can effectively resist deformation, and can ensure that molten glass overflows and is drawn down in a stable and uniform state, thus improving the thickness uniformity of overflow glass and improving the production quality of substrate glass.
Disclaimer: Curated by HT Syndication.
