MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202441100216 A) filed by Gm University on December 18, 2024, for Peel-Off Gel Mask.
Inventors include Alisha M Jain; Hidayath Javali; Jeevitha S; Manoj Kumar G B; Nayana D N; and Savitri K R.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: Title: Peel-Off Gel Mask This invention relates to the development of a peel-off gel mask formulated using ethanol extract of Plumeria alba leaves, known for its antimicrobial, antioxidant, and anti-inflammatory properties. The peel-off mask was prepared in three formulations (F1, F2, F3) with varying concentrations of the extract (0.08%, 0.16%, 0.32%). Among these, the F3 formulation exhibited superior physical and stability characteristics, including optimal viscosity, homogeneity, pH compatibility, and drying time. The antimicrobial activity was assessed against Staphylococcus aureus and Pseudomonas aeruginosa, demonstrating significant inhibitory zones. Additionally, antioxidant activity was evaluated through a DPPH assay, showing effective free radical scavenging potential. Irritation tests confirmed that the formulation is safe for use, causing no adverse skin reactions. Overall, the study highlights the potential of Plumeria alba as a natural and effective alternative for anti-acne treatments, offering a safe and efficient herbal-based remedy for skincare applications.
Disclaimer: Curated by HT Syndication.
