MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202641089401 A) filed by Vellore Institute Of Technology on July 22, 2026, for Photomask-Free Laser-Induced Spatiotemporal Patterning Of Supramolecular Hydrogels Through Catalytic In Situ Hydrogelator Generation.
Inventors include Chandan Maity; and Divya Lalbahadur Chauhan.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: ABSTRACT The present invention relates to a photomask-free method for spatiotemporal patterning of supramolecular hydrogels through laser-induced catalytic in situ generation of low-molecular-weight hydrogelators. A precursor composition comprising a protected coumarin aldehyde precursor, a hydrazine-containing precursor and a photoswitchable merocyanine photoacid catalyst is subjected to localized visible-light irradiation. Photoisomerization of the catalyst generates localized proton release, which sequentially catalyzes deprotection of the protected aldehyde precursor followed by hydrazone bond formation to generate a hydrazone-based hydrogelator. The generated hydrogelator undergoes spontaneous supramolecular self-assembly through non-covalent interactions to form a three-dimensional fibrous hydrogel selectively within irradiated regions. The precursor composition remains substantially stable prior to irradiation, thereby suppressing premature gelation. The invention enables programmable spatial regulation of hydrogel formation without physical photomasks, polymer photocrosslinking or photoresponsive hydrogelator modification.
Disclaimer: Curated by HT Syndication.
