MUMBAI, India, July 30 -- Intellectual Property India has published a patent application (202411088545 A) filed by Indian Institute Of Technology Jodhpur on November 15, 2024, for Plasma Plume Signal Based Closed-Loop Control System And Method For Laser-Based Direct Energy Deposition Processes.
Inventors include Dr. Ravi K R; and Mohit Singh.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: The present disclosure relates to a plasma plume-based closed-loop control system (100) and method for regulating a direct energy deposition (DED) process in additive manufacturing. The method utilizes real-time optical emission spectrometry (OES) to monitor plasma plume intensity and dynamically adjust laser power within milliseconds. By correlating spectral intensity at specific wavelengths with melt pool regimes—lack-of-fusion, conduction, transition, and keyhole—the system maintains optimal heat input and stable melt pool behavior. A proportional-integral-derivative (PID) controller (922) processes real-time data to achieve precise power modulation, ensuring uniform deposition, reduced porosity, and improved metallurgical and geometric quality. The system eliminates the need for multiple sensors, reduces data latency, and enables adaptive control through a material-specific regime database (912) and self-learning algorithms (920), thereby enhancing process repeatability, efficiency, and component quality in additive manufacturing applications.
Disclaimer: Curated by HT Syndication.
