MUMBAI, India, July 31 -- Intellectual Property India has published a patent application (202411096449 A) filed by Amity University on December 06, 2024, for Pollution Prevent Silicone Adhesive Nose Mask.
Inventors include Dr Ajay Rana; Dr Garima Bhardwaj; S Vikram Singh; Prateek Chaturvedi; and Shubhi Gupta.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: The present invention discloses a pollution prevent silicone adhesive nose mask. This invention presents a silicone adhesive nose mask designed to filter airborne pollutants effectively. The mask consists of a silicone-fitted base that adheres directly to the user’s nose, providing a secure and comfortable fit without applying pressure on the ears. The filtration layer, made from polypropylene and non-woven fiber fabric, effectively filters particulate matter, bacteria, and other pollutants. Optionally, the mask includes antimicrobial agents for added protection. A detachable mouth mask allows for flexibility in varying pollution conditions, enabling the nose mask to be used alone or in combination with the mouth cover as required.
Disclaimer: Curated by HT Syndication.
