MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202648018983 A) filed by Idemitsu Kosan Co. , Ltd. on February 19, 2026, for Polycarbonate-Polyorganosiloxane Copolymer.
Inventors include Ishikawa, Yasuhiro; Watanabe,hajime; and Yamada, Aki.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: ABSTRACT POLYCARBONATE- POLYCARBONATE-POLYORGANOSILOXANE COPOLYME POLYORGANOSILOXANE COPOLYME POLYORGANOSILOXANE COPOLYMER 5 A poly carbonate-poly organosiloxane copolymer comprises a polycarbonate block (A-l) formed of a repeating unit with a specific structure and a polyorganosiloxane block (A-2) containing a repeating unit with a specific structure. A difference between the haze value (haze A) after retention for 3 minutes and the haze value (haze B) after retention for 20 minutes, of the 10 polycarbonate-polyorganosiloxane copolymer or a resin composition thereof at 300°C or 340°C, Ahaze, is less than 0.4.
Disclaimer: Curated by HT Syndication.
