MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202617064679 A) filed by W. R. Grace & Co. -Conn. on May 22, 2026, for Polyol Functionalized Colloidal Silica And Methods Of Production.
Inventor includes Gu, Feng.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: The present disclosure is directed to compositions that include water and a functionalized colloidal silica, where the functionalized colloidal silica includes silica particles (where each silica particle includes a surface) as well as a structural units according to Formula (I). The present disclosure also is directed to methods of making compositions of the present technology.
Disclaimer: Curated by HT Syndication.
