MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202411088779 A) filed by Birla Institute Of Technology And Science, Pilani on November 16, 2024, for Process For Nanoimprinting Of Metal-Containing Polymeric Coatings And Patterns.
Inventors include Ramakrishnan Ganesan; Jayati Ray Dutta; Ravikiran Nagarjuna; Anindita Thakur; and Aniket Balapure.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: The present invention provides a process for nanoimprinting of metal-containing polymeric coatings and patterns, said process including reacting 0.86 mmol of tertiary butyl acetoacetate (t-BAA) and 0.1 mmol of 3-methyl-3-oxetane methanol at 100°-150°C for 2-4 hours in a 12ml of solvent medium to form 3-methyloxetane-3- yl)methyl 3-oxobutanoate (OAA) monomer; adding 2-4 mmol equivalents of the monomer to 1 mmol equivalent of metal (M) ethoxide in a glass vial under inert gas atmosphere to form a liquid resin, wherein the monomer is selected from methyloxetane-3-yl)methyl 3-oxobutanoate (OAA) and epoxy acetoacetate (EAA); treating molds with 1H,1H,2H,2H-per-fluorodecyltrichlorosilane for 5 h inside an evacuated desiccator in order to decrease surface energy, wherein the molds are selected from transparent quartz and polydimethylsiloxane (PDMS); placing themolds on top of wet thin resin film and applying pressure to transfer pattern onto the resin film; subjecting the molds to UV irradiation with a Hg vapour lamp (125 W) for 1 min to induce formation of photoacids in the resist matrix; subjecting the molds to post exposure baking (PEB) by placing on hot plate at 110 °C for 3-5 min after UV exposure and demoulding the stamp after PEB; calcining the resin thin films at designated temperatures for 1 h to obtain corresponding metal oxide nano structures.
Disclaimer: Curated by HT Syndication.
