MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202647124053 A) filed by Nippon Chemiphar Co. , Ltd. on October 16, 2026, for Reaction Plate.
Inventors include Uemura Kenji; Tsukamoto Keita; and Shino Seiya.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: Provided is a reaction plate included in a biochemical reaction substrate used for allergy test or the like, whereby 1) a stable test can be performed by performing sufficient cleaning even when the number of times a reaction area is cleaned is reduced, and/or 2) the same test can be performed in an outer peripheral section and a central section of the reaction area by matching the detection sensitivity of the outer peripheral section and the detection sensitivity of an inner peripheral section of the reaction area. The reaction plate included in a biochemical reaction substrate has: a reaction area in which a specific binding substance that specifically reacts with a test substance in a specimen is immobilized; and an outflow prevention wall formed so as to surround the reaction area. A part where the reaction area and the outflow prevention wall abut is larger than a corner R of 0.10 mm.
Disclaimer: Curated by HT Syndication.
