MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202617073468 A) filed by Basf Se on June 12, 2026, for Recycling Of Material Residue Including Polymeric Materials.
Inventors include Graf, Nicole; Brejc, Andrej; Suri, Mamta; Majer, Marco Rainer; and Wendling, Timo.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: Disclosed is a method for recycling of material residue from one or more textiles: providing one or more physical material identifier(s) of the one or more textiles and material data associated with material containing synthetic polymer(s); providing one or more recycling unit identifier(s) associated with a recycling unit for collecting the material residue from the material of the one or more textiles; generating one or more recycling instruction(s) based on the recycling unit identifier(s) and the material data; providing the generated recycling instructions for recycling of the material residue from the one or more textiles. Disclosed are further methods, apparatuses, uses, computer programs and computer-readable media.
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