MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202617068648 A) filed by Shine Technologies, LLC on June 01, 2026, for Reduced Form Factor Plasma Windows Positioned In A Beam Accelerator System.
Inventors include Barrows, Preston; and Blatz, Joshua.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: A beam accelerator system comprises: a beamline comprising a low-pressure chamber and an ion accelerator configured to generate an ion beam; a target chamber; and a plasma window assembly interposed between and fluidly connecting the beamline and the target chamber. The plasma window assembly comprises an anode and a plurality of cooling plates. Each cooling plate comprises an aperture having an aperture axis that is aligned with an aperture axis of an aperture in one or more adjacent cooling plates to form a plasma channel. One or more cooling plates of the plurality of cooling plates is a cathode plate comprising at least one cathode.
Disclaimer: Curated by HT Syndication.
