MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202617073672 A) filed by Krosakiharima Corporation on June 13, 2026, for Refractory And Method For Producing Same.
Inventors include Kamio, Hidetoshi; and Shiohama, Michiharu.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: The present invention provides: a refractory which is capable of suppressing the occurrence of a large crack during use; and a method for producing the same. A refractory according to the present invention randomly contains, in a refractory tissue that is mainly composed of a refractory starting material, at least one of a burnable and eliminable sheet and a space that is formed by burning and eliminating the sheet. The refractory is obtained by a method for producing a refractory, the method including a step for adding and mixing a burnable and eliminable sheet to a refractory starting material formulation that is mainly composed of a refractory starting material. With respect to the burnable and eliminable sheet, if A is the representative length, B is the maximum length in the plane of the sheet in a direction that is orthogonal to the definition direction of the representative length A, and C is the thickness, C = 1 mm, C/A = 0.1, and 0.2 = B/A = 1.0 are satisfied.
Disclaimer: Curated by HT Syndication.
