MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202521006800 A) filed by Dr. J. J. Magdum College Of Engineering; Divase Tejas Nivrutti; and Prof Aditya N Magdum on January 28, 2025, for Revolutionary Single-Click Nanotechnology System For On-Demand Artificial Clothing Generation.
Inventors include Divase Tejas Nivrutti; and Prof Aditya N Magdum.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: Revolutionary Single-Click Nanotechnology System for On-Demand Artificial Clothing Generation This invention describes a Single-Click Nanotechnology System for generating customizable, adaptive, and sustainable garments using advanced nanotechnology and intelligent algorithms. The system enables users to design clothing by specifying style, material, and functionality through a user-friendly interface. Employing nanoscale robotic assemblers and a nanomaterial reservoir, garments are constructed layer by layer with embedded adaptive features, such as environmental responsiveness and health monitoring. Integrated sensors allow garments to adjust to temperature, humidity, and microbial conditions, while health monitoring modules track physiological parameters and provide therapeutic functionalities. The system also incorporates defense capabilities, including adaptive camouflage and protective barriers. By leveraging energy-efficient operations and biodegradable materials, the invention addresses sustainability challenges, minimizing waste and resource consumption. This revolutionary approach to garment production offers transformative applications in fashion, healthcare, defense, and wearable technology, redefining personalization, functionality, and eco-friendly manufacturing in the textile industry.
Disclaimer: Curated by HT Syndication.
