MUMBAI, India, June 19 -- Intellectual Property India has published a patent application (202617057607 A) filed by Tokyo Electron Limited on May 06, 2026, for Substrate Processing Apparatus, Processing Container Replacing Method, Substrate Processing Method, And Storage Medium.
Inventors include Umezaki, Shota; Hayashida, Takahiro; and Nakashima, Mikio.
The application for the patent was published on June 05, 2026, under issue no. 23/2026.
Abstract: A substrate treatment device (1) according to the present disclosure comprises: a treatment container (30); a supply line; a discharge line (34b); and a reinforcement member (40). The treatment container (30) has a treatment space (S) capable of accommodating a substrate (W), and the treatment space (S) is pressurized during the treatment of the substrate (W). The supply line supplies a treatment fluid into the treatment space (S). The discharge line (34b) discharges the treatment fluid in the treatment space (S). The reinforcement member (40) surrounds the outside of the treatment container (30) and is fixed integrally with the treatment container (30).
Disclaimer: Curated by HT Syndication.
