MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202644041704 A) filed by Canon Kabushiki Kaisha - on April 01, 2026, for Substrate Processing Apparatus And Article Manufacturing Method.
Inventor includes Koichi Tamura.
The application for the patent was published on October 23, 2026, under issue no. 43/2026.
Abstract: A substrate processing apparatus comprises a stage (20) configured to hold a substrate (16); a hand (42, 43) configured to convey the substrate; and a controller (30) configured to control at least one of a substrate supply operation onto the stage by the hand and a substrate collection operation from the stage by the hand. A chuck (21) selected from among a plurality of types of chucks is mounted on the stage, and pins (22) configured to protrude from the chuck and support the substrate in the at least one are provided in the stage. The controller is configured to control, in accordance with the thickness of the chuck mounted on the stage, a height of the hand when inserting/removing the hand between the substrate on the pins and the chuck in the at least one. [Figure 1B]
Disclaimer: Curated by HT Syndication.
