MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202541048649 A) filed by Insilicon Solutions India Private Limited on May 20, 2025, for System And Method For Measurement And Characterization Of Nano-Particulate Contamination In Semiconductor Process Chemicals.
Inventors include Blesson Varghese; Pranesh Muralidhar; Shraddha Thakur; Midathala Yogesh; and Ashutosh Shrikant Bhabhe.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: ABSTRACT A method (100) of measuring and characterizing nanoparticulate contamination in chemicals is described. The method (100) includes the steps of providing (102) an engineered doped or undoped semiconductor substrate with surface nanopores and a pore density and a pore size that varies as a function of depth of the engineered semiconductor substrate, exposing (104) the engineered semiconductor substrate with surface nanopores to a chemical containing at least one contaminant; and, detecting (106) the at least one contaminant on the engineered semiconductor substrate with surface nanopores by means of an analytical method. Figure 1 may be used for the abstract.
Disclaimer: Curated by HT Syndication.
