MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202644000446 A) filed by Xiamen Hithium Energy Storage Technology Co. , Ltd. on January 02, 2026, for Top Cover And Processing Method Therefor, Energy Storage Device, And Electricity-Consuming Apparatus.
Inventor includes Changhao Wang.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: ABSTRACT TOP COVER AND PROCESSING METHOD THEREFOR, ENERGY STORAGE DEVICE, AND ELECTRICITY- CONSUMING APPARATUS The disclosure provides a processing method for a top cover, a top cover, an energy storage device, and an electricity-consuming apparatus. The processing method includes providing a top cover, wherein the top cover includes a first surface and a second surface that are opposite to each other in a thickness direction of the top cover, and a side surface located between the first surface and the second surface. A mask is placed on the first surface of the top cover, wherein the mask at least partially covers the first surface to expose a flushing region. The flushing region is a region of the first surface not covered by the mask. A width of the flushing region is greater than or equal to 0.1 mm and less than or equal to 0.3 mm, and the width of the flushing region is a minimum distance between an outer contour of the mask and an outer contour of the first surface. Processing equipment flushes the flushing region to form a flushed surface, wherein the flushed surface is located between the first surface and the side surface, and the flushed surface is connected to both the first surface and the side surface.
Disclaimer: Curated by HT Syndication.
