MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202641085492 A) filed by Chennai Institute Of Technology on July 13, 2026, for Topology Optimized 3d Printed Nasal Airway Dilator.
Inventors include Mr Murugan V; Niranjana N; and Or. V. Dhinakaran.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: ABSTRACT Title: TOPOLOGY OPTIMIZED 3D PRINTED NASAL AIRWAY DILATOR 5 10 15 The titled invention discloses a topology optimized three- dimensional printed nasal airway dilator for improving airflow through the nasal passages and reducing snoring caused by nasal airway obstruction. The device includes a dual-leg nasal dilator structure (1) configured to maintain separation between the nasal passages, a curved bridge section (2) connecting the support legs, circular airflow passages (3) for facilitating airflow, a gyroid lattice structure (4) positioned at the vomer bone-nasal septum interface, a lower support section (5) for maintaining stable positioning, an outer wall structure (6) providing structural strength, and a biodegradable PLA body (7) manufactured using the Fused Filament Fabrication (FFF) process. The gyroid lattice structure provides controlled elastic deformation and improved mechanical flexibility during breathing, while the customized design improves anatomical fit, airflow efficiency, and user comfort. The invention provides a lightweight, anatomically customized, and structurally stable nasal airway dilator for improving breathing comfort and reducing snoring.
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