MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202621085742 A) filed by Garware Hi-Tech Films Limited on July 13, 2026, for Two Layer Co-Extruded High Shrink Polyester Film And A Process Of Its Manufacturing.
Inventor includes Garware, Monika Shashikant.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: ABSTRACT TWO LAYER CO-EXTRUDED HIGH SHRINK POLYESTER FILM AND A PROCESS OF ITS MANUFACTURING The present disclosure relates to a two layer co-extruded high shrink polyester film and a process for its manufacturing. The two layer co-extruded high shrink polyester film comprises a co-extruded film of a first polymer melt and a second polymer melt wherein the first polymer melt comprises silica containing first co-polyester, and an additive; and the second polymer melt comprises silica containing second co-polyester. The high shrink polyester film of the present disclosure has a coefficient of friction (COF) in the range of 0.25 to 0.36, improved surface roughness and reduced interlayer friction. The process of the present disclosure is simple, and economic.
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