MUMBAI, India, Aug. 17 -- Intellectual Property India has published a patent application (202617078520 A) filed by Arkema France on June 25, 2026, for Use Of At Least One Perester To Initiate The Polymerisation Or Copolymerisation Of Ethylene Under High Pressure.
Inventors include Van Hemelryck, Bruno; and Hub, Serge.
The application for the patent was published on August 14, 2026, under issue no. 33/2026.
Abstract: The present invention relates to the use of at least one peroxide selected from the group consisting of the peresters of formula (I), alone or in combination with one or more different additional peroxide(s), for the radical polymerisation or copolymerisation of ethylene under high pressure. The invention also relates to a method for preparing polyethylene, comprising a step of radical polymerisation or copolymerisation of ethylene under high pressure in the presence of at least one peroxide selected from the group consisting of the peresters of formula (I), alone or in combination with one or more different additional peroxide(s). The present invention also relates to a composition comprising ethylene, at least one peroxide selected from the group consisting of the peresters of formula (I), and optionally one or more additional peroxide(s) other than the peresters of formula (I).
Disclaimer: Curated by HT Syndication.
